Fraunhofer Institute for Electronic Nano SystemsProcesses and Technologies for Micro and Nanoelectronics with the focus on back-end of line and Interconnects
The development of individual processes (metal ALD, CVD, PVD, ULK processes, dry etching), novel concepts for diffusion barriers, alternative interconnect architectures for the reduction of parasitic effects and process and technology development for memristor crossbar arrays are the main focus of this topic.