Nuremberg/Germany  /  June 25, 2019  -  June 27, 2019


The Measurement Fair

hall 5
booth 248

Fraunhofer ENAS introduces a waferlevel process for electroplating of aluminum, a piezoelectic actuator based on aluminum nitride and a near-field measurement system for detection of electric and magnetic fields on electronic devices.

Waferlevel process for electroplating of aluminum:
Within a public funded project (AioLi BMBF-FKZ: 16ES0329K), the Fraunhofer ENAS developed a deposition process of thick aluminum layers on various substrates, like silicon, printed circuit board or ceramics. Due to the negative standard potential of aluminum, the electrodeposition is carried out in an ionic liquid instead of water-based electrolytes. With this method, it is possible to deposit aluminum layers up to 30 µm on 6-inch substrates. The wafer-level coating is therefore unique in the world. The layers can be used as conductor paths, heat management, bond pads or bond frames for chip and wafer-level bonding.

Aluminum nitride for piezoelectric sensor and acutator systems:
Fraunhofer ENAS and the Center for Microtechnologies of Chemnitz University of Technology developed a technology to sputter and characterize piezoelectric thin film AlN and integrate this material in silicon-based MEMS and NEMS applications. These microsystems contain a high energy density which allows the miniaturization of MEMS and NEMS. In contrast to the common used lead zirconate titanate (PZT), the aluminum nitride can easily be integrated in CMOS processes. The deposition and patterning of AlN can be realized in conventional equipment for aluminum-based back-end of line technologies. This enables the common fabrication of piezoMEMS and CMOS devices in the same production line. Fraunhofer ENAS shows different applications.

Near field measurements with the NFS3000 for electromagnetic characterization of components and systems:
By use of near-field measurements, electric and magnetic fields can be locally resolved and are depicted a few millimeter to centimeter above the device under test (DUT). One system for electromagnetic near-field measurements is the NFS3000. It was developed at the Fraunhofer Institute for Electronic Nano Systems in Paderborn. One of its uniqueness’s is the very precise positioning system with an accuracy of one millimeter and offers a maximum movement range of 80 cm x 50 cm x 50 cm (xyz). With a phase-related measurement of magnetic and electric fields up to 2.7 GHz and a pure measurement of amplitudes up to 6 GHz, systems up until the Wi-Fi and Bluetooth spectrum can be characterized. Currently, the extension of the measurement system up to 80 GHz is planned to be equipped for future 5G and radar applications.