Fraunhofer Institute for Electronic Nano Systems
The topic "Inline Metrology and Data" addresses measurements, measurement methods and metrology on wafer level in the context of the technological realization of semiconductor devices. In addition to the measurements and measurement processes themselves, the processing and handling of the measurement data is of crucial importance.
The intelligent linking of measurement data and production parameters (process data) raises technology development and quality management to a new level. Artificial intelligence and multi-scale simulations are increasingly playing a role in this. Inline Metrology and Data is therefore both a link and central topic and is positioned at Fraunhofer ENAS as an independent research topic directly in the central FAB Management.
It therefore supports all internal technology projects and is at the same time open to our external customers and partners. We are happy to develop metrology and data strategies together with you based on your specific needs.