Events

PESM 2025 provides a forum for open discussions between science and technology, targeting scientists, process engineers, Ph.D. students, and industrial partners involved in dry etching, plasma processing, and other vacuum-based removal techniques such as ion beam, neutral beam, and gaseous thermal etching.

Conference Focus:

• Plasma etching and cleaning challenges for semiconductors & memory applications
• More-than-Moore and quantum applications
• Vapor cleaning, isotropic etch concepts & conditioning
• Process diagnostics, modeling, and data analysis