Fraunhofer Institute for Electronic Nano Systems
The project "NewLPCVD" focuses on acquiring a modern coating/deposition system to build and expand capabilities in the fields of photonics and micromechanical components. With the system, the institute will have access to a reliable technology for producing innovative sensors as well as optical and photonic components, which will displace established technologies and components and open up new target markets. Through the acquisition of the system, materials such as polysilicon, amorphous silicon, and silicon nitride can be processed in very high film quality on wafers up to 200 mm in diameter. The films are suitable, for example, for applications in the communications sector or in photonic circuits, in order to minimize information losses.
Funding amount: 1.174.800 €