Fraunhofer Institute for Electronic Nano Systems
Fraunhofer Institute for Electronic Nano Systems

ALPACA – Atomic Layer Processing: Plant Technology, Chemical Supply, and Applications

Separated multilayer stacks are structured and passivated in dedicated systems: top: following the established processing procedure; bottom: in the ALPACA project, with a reduction and optimisation of the system technology.

The ongoing miniaturization and increasing complexity of components in microelectronics necessitate a constant search for new solutions in materials processing. For novel spintronic components used in sensors and memory devices, the precise patterning of multi-layer metal stacks is crucial. A new piece of equipment technology currently under development offers the potential to simplify the production process whilst significantly reducing both costs and space requirements. The aim of the KMU-innovativ project ALPACA is the simulation-supported further development of an innovative equipment and process technology that enables efficient and precise processing at the atomic layer level.

 

Our project partner:

  • SENTECH Instruments GmbH

Project duration: January 1, 2026 – December 31, 2027

 

Further information can be found here (German only).