Fraunhofer Institute for Electronic Nano Systems
Fraunhofer Institute for Electronic Nano Systems

MultiALD – Plant and process development for atomic layer deposition of aluminum-based thin films for barriers, actuators and electronics

Schematic depiction of the process

The MultiALD project focuses on water vapor barrier and crystalline actuator materials based on aluminum-containing thin-film systems. The work includes quantum chemistry-supported process development for layer deposition and characterization. Functionality is demonstrated using demonstrators. The work is based on the scia Atol 200 system with its HF electrode system, which, through revision and further development, will enable higher process temperatures and better controllability in plasma processes.

Our project partners:

  • scia Systems GmbH Chemnitz (Coordinator)
  • FAP Forschungs- und Applikationslabor Plasmatechnik GmbH (Dresden)
  • InfraTec GmbH Infrarotsensorik und Messtechnik (Dresden)
  • Center for Micro and Nano Technologies (ZfM), Chemnitz University of Technology (Chemnitz)

Project duration: July 22, 2025 to December 31, 2027