Technologies

MEMS and MOEMS technologies

  • High aspect ratio (HAR) technologies for high-precision capacitive MEMS:  Bonding and Deep Reactive Ion Etching (BDRIE)
  • Bulk technologies
  • Piezo-MEMS technologies
  • Thin film encapsulation
  • MEMS packaging and 3D integration

 

Integration technologies for micro and nano electronics

  • High density copper interconnects for hybrid bonding
  • New materials and thin film processes
  • Development and conceptual design of integration schemes
  • Modeling and simulation of processes and equipment
  • Integration of Graphene for horizontal wiring
  • Integration of CNT-FET module for post-BEOL embedded electronic functionality and 3D integration

 

Fluidic integration technologies

  • Prototyping and assembling of (micro)fluidic systems
  • Peripheral systems (instruments, electronics, software)
  • Microfluidic systems based on silicon, glass, polymers, metals
  • Liquid-based microfluidics
    • (Bio)sensor integration
    • Assay integration
    • Integration of actuators (micro pumps, valves, heater)

 

Nano integration technologies

  • Nano lithography
    • Electron beam lithography
    • Nano imprint lithography
  • Layer-based technologies
    • Nanocomposites (semiconducting metal oxides, quantum dot-based layers: LEDs (Vis-NIR))
    • Magnetic field sensors (multi-dimensional GMR sensors, microstructuring, laser annealing)
    • Memristive components (functional multilayers, circuit technologies)
  • 1D and 2D nanomaterials on wafer-level and special substrates
  • Nano device integration steps: structuring, cleaning, contacting, functionalization, passivation
  • Vertically-aligned CNTs (VACNT) with CVD and transfer (at room temperature)
  • Preparation of flexible foils and membranes with nanostructured C-electrodes
  • Graphene integration from dispersion and transfer
  • Integration of electronic grade semiconducting SWCNTs
  • Technology for suspended nanodevices
  • Surface technology for strain-controlled nanomaterials
  • Technology for heterogeneous systems (e.g., MEMS/CNTFET)
  • Specific development of nanodevice technologies (e.g., quantum applications)
  • Analytics: Waferscale analytics for nanostructures and nanodevices (AFM, Raman spectroscopy, semiconductor parameter analysis)

 

Printing technologies

  • Sheet- and web-based printing processes up to pilot scale (aerosol jet, dispensing, gravure, inkjet, piezo jetting, screen printing, stencil printing)
  • 2D and 3D surface functionalization by
    • Printing of functional inks single/multi-layer on flexible and rigid substrates
    • Functionality formation by post-treatment of printed patterns
      • Sintering (i.e., IR, intense pulsed light, thermal, laser)
      • UV curing
  • Application printing technologies for system packaging
    • Printing of inks/solder materials as
      • Intermediate layer for chip and waferlevel bonding
      • Dielectric barrier for surface passivation/encapsulation
      • Intermediate layers for power electronics
  • Integration of printing technologies in manufacturing environments
    • Design and printing-based manufacturing of tailor-made flexible thin film batteries
    • Design, simulation, printing and characterization of customized antennas (RFID, WLAN, Bluetooth, LTE, UMTS etc.)
    • Design and printing of glass frit based intermediate layers for high throughput waferlevel bonding

 

Quantum technologies and neuromorphic computing

  • We develop
    • Wafer-level integration technologies for neuromorphic computing
    • Components and technologies for utilizing quantum effects, quantum computing and quantum sensing
  • Focus areas
    • Wafer technologies with special deposition and structuring processes (e.g., nanostructured crossbar arrays, integrated quantum dots, BFO layers)
    • Wafer technologies for the integration of quantum dots (e.g., LEDs, single-photon sources)
    • Packaging technologies for complex and highly integrated quantum chips (e.g., ion traps, single-photon sources)
    • Micro and nanostructured optical components (e.g., metalenses, photonic integrated circuits)
    • Consideration of aspects of thermomechanical reliability under cryognic conditions