The ALD Lab Dresden is a collaboration of research institutes in Dresden applying and developing atomic layer deposition (ALD). ALD is a unique thin film deposition method which is based on alternating saturated surface reactions and thereby the film growth proceeds in a self-limiting manner. Due to the particular advantages like the simple and accurate control of the film thickness, the excellent uniformity and conformity as well as lower deposition temperatures compared to other methods (e.g. CVD, PVD) ALD has been implemented in high volume manufacturing for technologically advanced products and devices (e.g. DRAM, Advanced CMOS, and functional coatings).
In ALD Lab Dresden the participating institutes have brought together their expertise and capabilities in ALD and beyond. Thus a unique competence centre in atomic layer deposition has been formed. Activities are ranging from fundamental research and precursor evaluation to large scale process development for novel materials for industrial coatings, future electronic devices and energy harvesting devices such as solar cells.
Dresden Cluster for Atomic Layer Deposition-Member:
- Fraunhofer IPMS-CNT
- Fraunhofer IKTS
- Fraunhofer IPMS
- Fraunhofer ENAS
- TU Dresden - IHM